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Volumn 303, Issue 1, 2002, Pages 114-122
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Why model high-k dielectrics?
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Author keywords
[No Author keywords available]
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Indexed keywords
INTERFACES (MATERIALS);
PERMITTIVITY;
SILICA;
STOICHIOMETRY;
INTERMEDIATE LAYERS;
DIELECTRIC MATERIALS;
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EID: 0036567813
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-3093(02)00966-3 Document Type: Article |
Times cited : (16)
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References (48)
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