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Volumn 15, Issue 2, 2002, Pages 169-182

Metrology technology for the 70-nm node: Process control through amplification and averaging microscopic changes

Author keywords

Critical dimension; Junction depth; Metrology; Thickness measurement

Indexed keywords

CMOS INTEGRATED CIRCUITS; CRYSTAL DEFECTS; DIELECTRIC MATERIALS; LEAKAGE CURRENTS; MICROPROCESSOR CHIPS; PERMITTIVITY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE TESTING; SEMICONDUCTOR JUNCTIONS; SEMICONDUCTOR STORAGE; STATISTICAL PROCESS CONTROL; THICKNESS MEASUREMENT;

EID: 0036565026     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.999588     Document Type: Review
Times cited : (4)

References (40)
  • 15


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.