Seeing the forest for the trees: A new approach to CD control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 212-220

  Ausschnitt, Christopher P ^a   Lagus, Mark E ^a  

^a IBM   (United States)

Author keywords

Critical dimension; Critical dimension control; Lithography; Lithography control; Metrology; Optical metrology

Indexed keywords

CMOS INTEGRATED CIRCUITS; FEEDBACK CONTROL; LITHOGRAPHY; PATTERN RECOGNITION;

OPTICAL METROLOGY;

SEMICONDUCTOR DEVICES;

EID: 0032402979     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308729     Document Type: Conference Paper

References (8)

1. Thinking small: Challenges for metrology at century's end
2. Measuring dimensions using Murray daggers
3. Latent image metrology for production wafer steppers
4. Automatic laser scanning focus detection method using primed focus pattern
5. Electrical measurement of submicrometer contact holes
6. Position measurement with a resolution and noise-limited instrument