Phase profilometry for the 193 nm lithography gate stack

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 116-124

  Jakatdar, Nickhil ^a   Niu, Xinhui ^a   Bao, Junwei ^a   Spanos, Costas ^a   Yedur, Sanjay ^a   Deleporte, Alain ^a  

^a Timbre Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFRACTION GRATINGS; ELLIPSOMETRY; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPY;

PHASE PROFILOMETRY (PP); SPECTROSCOPIC ELLIPSOMETRY;

NANOTECHNOLOGY;

EID: 0033714549     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)