DUV/VUV light scattering measurement of optical components for lithography applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4099, Issue , 2000, Pages 74-81

  Gliech, Stefan ^a   Steinert, Joerg ^a   Flemming, Marcel ^a   Duparre, Angela ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; LIGHT SCATTERING; OPTICAL COATINGS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

OPTICAL COMPONENTS;

OPTICAL SYSTEMS;

EID: 0034546854     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.405807     Document Type: Conference Paper

References (9)