Round robin determination of power spectral densities of different Si wafer surfaces

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3275, Issue , 1998, Pages 26-36

  Marx, Egon ^a   Malik, Igor J ^a   Strausser, Yale E ^a   Bristow, Thomas ^a   Poduje, Noel ^a   Stover, John C ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Power spectral density; Si wafers; Surface imaging; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; INTERFEROMETRY; LIGHT SCATTERING; PROFILOMETRY; SURFACE ROUGHNESS;

POWER SPECTRAL DENSITIES (PSD);

SILICON WAFERS;

EID: 0032400624     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.304409     Document Type: Conference Paper

References (39)

1. Recent developments in surface roughness characterization
2. Characterizing microroughness and haze on silicon wafers
3. Microroughness measurements on polished silicon wafers
4. Regimes of surface roughness measurable with light scattering
5. Surface roughness of silicon wafers on different lateral length scales
6. Surface smoothing effects of thin film deposition
7. Elastic light scattering measurements of Si-surfaces
8. A survey of non-destructive surface characterization methods used to insure reliable gate oxide fabrication for silicon IC devices
9. Determination of nanometer structures and surface roughness of polished Si wafers by scanning tunneling microscopy
10. Surface roughness measurements using a nomarski type scanning instrument
11. Microroughness of silicon wafers
12. Quantitative microroughness analysis down to the nanometer scale
13. Relationship between surface scattering and microtopographic features
14. Characterization of the topography of vacuum-deposited films. 1: Light scattering
15. Achieving high quality ULSI gate oxides: An examination of some relevant factors
16. Fine particle inspection down to 38 nm on bare wafer with micro roughness by side-scattering light detection
17. 2 interface microroughness
18. 2 interface
19. 2 interfaces and on second harmonic generation at these interfaces
20. Interface roughness scattering and electron mobility in quantum wires
21. 2 mixtures
22. The use of power spectral density (PSD) to specify optical surface
23. Specification of surface figure and finish in terms of system performance
24. Light scatter from polysilicon and aluminum surfaces and comparison with surface-roughness statistics by atomic force microscopy
25. Determination of interface roughness by using a spectroscopic total-integrated-scatter instrument
26. Developing a haze and microroughness reference standard
27. Surface roughness of Si wafers: Correlating AFM and haze measurements
28. Microstructure characterization by angle-resolved scatter and comparison to measurements made by other techniques
29. Scanning probe metrology
30. Calibration of height in atomic force microscope images with subnanometer scale silicon dioxide steps
31. Comparison of low-scatter-mirror PSD derived from multiple-wavelength BRDFs and WYKO profilometer data
32. Fractal surface finish
33. Prediction of BRDFs from surface profile measurements
34. Optimal estimation of finish parameters