Spectra characterization of silicon carbonitride thin films by reactive radio frequency sputtering

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 1, 2002, Pages 159-163

  Peng, Xiaofeng ^a   Song, Lixin ^a   Le, Jun ^a   Hu, Xingfang ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BINDING ENERGY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION IMPLANTATION; SILICON NITRIDE; SINGLE CRYSTALS; SPECTRUM ANALYSIS; SPUTTER DEPOSITION; SUBSTRATES; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

RADIO FREQUENCY SPUTTERING;

THIN FILMS;

EID: 0036118153     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1431952     Document Type: Conference Paper

References (14)