Phase formation and stability of N+ implanted SiC thin films

Journal of Applied Physics

Volumn 81, Issue 1, 1997, Pages 146-149

  Capelletti, R ^a   Miotello, A ^b   Ossi, P M ^c  

^a UNIVERSITY OF PARMA   (Italy)

^b UNIVERSITY OF TRENTO   (Italy)

^c POLITECNICO DI MILANO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000972457     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364001     Document Type: Article

References (17)

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