Implementation of spectroscopic critical dimension (SCD™) for gate CD control and stepper characterization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 462-471

  Allgair, John ^a   Benoit, Dave ^a   Drew, Mark ^a   Hershey, Rob ^a   Litt, Lloyd C ^a   Herrera, Pedro ^b   Whitney, Umar ^b   Guevremont, Marco ^b   Levy, Ady ^b   Lakkapragada, Suresh ^b  

^a MOTOROLA INC   (United States)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

Exposure; Focus; Optical microscopy; Process control; Spectroscopic CD

Indexed keywords

OPTICAL MICROSCOPY; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS;

OPTICAL METROLOGY TECHNIQUES;

ELLIPSOMETRY;

EID: 0005083869     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436771     Document Type: Article

References (2)

1. Manufacturing Considerations for Implementation of Scatterometry for Process Monitoring