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Volumn 17, Issue 19, 2001, Pages 6005-6012

Microscope projection photolithography for rapid prototyping of masters with micron-scale features for use in soft lithography

Author keywords

[No Author keywords available]

Indexed keywords

SOFT LITHOGRAPHY;

EID: 0035909171     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la010655t     Document Type: Article
Times cited : (138)

References (34)
  • 10
    • 0011338958 scopus 로고    scopus 로고
    • note
    • Features as small as 10 μm can be produced by the imagesetter although reproducible patterns are limited to straight lines and dots with periodicity larger than the feature size (see Figure 2a). There is substantial variation in the uniformity of shape and size of individual features, however. Arbitrary designs show significant distortions of the original shapes.
  • 11
    • 0011345838 scopus 로고    scopus 로고
    • For a detailed description of microscopy illumination techniques and the resolving power of microscopes, see Molecular Expressions Microscopy Primer (http://micro.maguet.fsu.edu/primer/anatomy/ illumination.html).
    • Molecular Expressions Microscopy Primer
  • 23
    • 0011332016 scopus 로고    scopus 로고
    • note
    • The optics in the microscope are glass which are compatible with the near-UV wavelengths emitted by the Hg lamp.
  • 24
    • 0011300486 scopus 로고    scopus 로고
    • note
    • The dose array is a series of exposures on a photoresist-coated substrate where the time of exposure is varied to determine the optimal exposure time for the given microscope configuration, mask, and sample. An array is prepared for each new session of lithography and each new mask used. The development time is a fixed length of 45-60 s for all exposures.
  • 28
    • 0011350379 scopus 로고    scopus 로고
    • note
    • 6-9,29.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.