Using patterns in microfiche as photomasks in 10-μm-scale microfabrication

Langmuir

Volumn 15, Issue 19, 1999, Pages 6575-6581

  Deng, Tao ^a   Tien, Joe ^a   Xu, Bing ^a   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTOMERS; PHOTORESISTS; PLASTIC MOLDS; PLASTIC SHEETS; POLYMERIC MEMBRANES;

MICROFICHE; PHOTOMASKS; SOFT LITHOGRAPHY;

MASKS;

EID: 0032691240     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la990372p     Document Type: Article

References (19)

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17. We define the error of registration as the displacement of the final position of one pattern from the ideal position of that pattern.
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