Projection photolithography utilizing a schwarzschild microscope and self-assembled alkanethiol monolayers as simple photoresists

Langmuir

Volumn 12, Issue 8, 1996, Pages 2121-2124

  Behm, Jane M ^a,b   Lykke, Keith R ^a   Pellin, Michael J ^a   Hemminger, John C ^b  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROSCOPES; MICROSCOPIC EXAMINATION; MONOLAYERS; OXIDATION; PHOTOLITHOGRAPHY; PHOTORESISTS; ULTRAVIOLET RADIATION;

ALKANETHIOL; SCHWARZCHILD MICROSCOPE; SELF ASSEMBLED MONOLAYERS;

LANGMUIR BLODGETT FILMS;

EID: 0030128337     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la950811u     Document Type: Article

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