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Volumn 55, Issue 20, 1997, Pages 13829-13834
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Why Si(100) steps are rougher after etching
a a b b |
Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0003424434
PISSN: 10980121
EISSN: 1550235X
Source Type: Journal
DOI: 10.1103/PhysRevB.55.13829 Document Type: Article |
Times cited : (7)
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References (15)
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