Intriguing kinetics for chlorine etching of the Si(100)-(2x1) surface

Journal of Chemical Physics

Volumn 110, Issue 8, 1999, Pages 4009-4012

  Dohnalek Z ^a   Nishino, H ^a   Kamoshida, N ^a,b   Yates Jr , J T ^a  

^a UNIVERSITY OF PITTSBURGH   (United States)

^b NIHON UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141523542     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.479107     Document Type: Article

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