Role of dimer stacking-fault structures in Si(111) growth and etching

Surface Science

Volumn 385, Issue 2-3, 1997, Pages 281-293

  Itchkawitz, B S ^a,b   McEllistrem, M ^a   Grube, H ^a   Boland, John J ^a  

^a The University of North Carolina at Chapel Hill   (United States)

^b UNIVERSITY OF VIRGINIA SCHOOL OF LAW   (United States)

Author keywords

Epitaxy; Etching; Halogens; Low index single crystal surfaces; Molecule solid reactions; Scanning tunneling microscopy; Silicon; Surface structure and roughness

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; ETCHING; HALOGEN COMPOUNDS; MOLECULAR BEAM EPITAXY; NUCLEATION; STACKING FAULTS; SURFACE ROUGHNESS;

ADATOMS; DIMER STACKING FAULTS; LOW INDEX SINGLE CRYSTALS; SILICON HALIDES;

SEMICONDUCTING SILICON;

EID: 0031197266     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00198-2     Document Type: Article

References (18)

1. K. Takayanagi, Y. Tanishiro, M. Takahashi, J. Vac. Sci. Technol. A 3 (1985) 1502.
2. D. Vanderbilt, Phys. Rev. B 36 (1987) 6209.
3. J.S. Villarubia, J.J. Boland, Phys. Rev. Lett. 63 (1989) 306.
4. J.J. Boland, J.S. Villarrubia, Science 248 (1990) 838.
5. B.S. Itchkawitz, M. McEllistrem, J.J. Boland, Phys. Rev. Lett. 78 (1997) 98.
6. U. Köhler, J.E. Demuth, R.J. Hamers, J. Vac. Sci. Technol. A 7 (1989) 2860.
7. R.T. Tung, F. Schrey, Phys. Rev. Lett. 63 (1989) 1277.
8. U. Köhler, L. Andersohn, B. Dahlheimer, Appl. Phys. 57 (1993) 491.
9. U. Memmert, A. Berkó, R.J. Behm, Surf. Sci. 325 (1993) L441.
10. L. Andersohn, Th.Berke, U. Köhler, B. Voightländer, J. Vac. Sci. Technol. A 14 (1996) 312.
11. R.J. Phaneuf, E.D. Williams, Phys. Rev. B 41 (1990) 2991.
12. T. Hasegawa, M. Kohno, S. Hosaka, S. Hosoki, Phys. Rev. B 48 (1993) 1943.
13. R.J. Pechman, T. Moriwaki, J.H. Weaver, G.S. Khoo, Surf. Sci. 341 (1995) L1085.
14. F. Owman, P. Mårtensson, Surf. Sci. 324 (1995) 211.
15. B.S. Swartzentruber, Y.-W. Mo, R. Kariotis, M.G. Lagally, M.B. Webb, Phys. Rev. Lett. 65 (1990) 1913.
16. R.J. Pechman, X.-S. Wang, J.H. Weaver, Phys. Rev. B 52 (1995) 11412.
17. H.E. Hessel, A. Feltz, M. Reiter, U. Memmert, R.J. Behm, Chem. Phys. Lett. 186 (1991) 275.
18. G.J. Pietsch, U. Kohler, M. Henzler, J. Appl. Phys. 73 (1993) 4797.