Si(100)-(2×1) etching with fluorine: Planar removal versus three dimensional pitting

Physical Review Letters

Volumn 83, Issue 16, 1999, Pages 3210-3213

  Nakayama, Koji S ^a   Weaver, J H ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 17744415597     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.83.3210     Document Type: Article

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