Topographic study of sputter-deposited film with different process parameters

Journal of Applied Physics

Volumn 89, Issue 12, 2001, Pages 7825-7832

  Ju, Shin Pon ^a   Weng, Cheng I ^a   Chang, Jee Gong ^a   Hwang, Chi Chuan ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035875624     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1371007     Document Type: Article

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