Molecular dynamics simulations on structural characteristics of A1 thin films in early sputtering process

JSME International Journal, Series A: Mechanics and Material Engineering

Volumn 42, Issue 3, 1999, Pages 334-341

  Iizuka, Takashi ^a   Hoshide, Toshihiko ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Aluminum; EAM potential; Microstructure; Molecular dynamics; Morse potential; Sputtering; Thin film

Indexed keywords

COMPUTER SIMULATION; FILM PREPARATION; MATHEMATICAL MODELS; METALLOGRAPHIC MICROSTRUCTURE; MOLECULAR DYNAMICS; MOLECULAR STRUCTURE; SPUTTER DEPOSITION; TEMPERATURE; THIN FILMS;

EMBEDDED ATOM METHOD; MORSE POTENTIAL; RADIAL DISTRIBUTION FUNCTION; STRUCTURAL PROPERTIES;

ALUMINUM;

EID: 0040368661     PISSN: 13408046     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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