Molecular dynamics simulation of low energy cluster deposition during diffusion-limited thin film growth

Nanostructured Materials

Volumn 8, Issue 3, 1997, Pages 253-268

  Kelchner, C L ^a   DePristo, A E ^a  

^a IOWA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; FILM GROWTH; METALLIC FILMS; MOLECULAR DYNAMICS; NANOSTRUCTURED MATERIALS; SURFACE ROUGHNESS;

DIFFUSION LIMITED THIN FILM GROWTH; LOW ENERGY CLUSTER DEPOSITION;

THIN FILMS;

EID: 0031143899     PISSN: 09659773     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0965-9773(97)00166-9     Document Type: Article

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