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Physica B: Condensed Matter

Volumn 253, Issue 1-2, 1998, Pages 28-39

X-ray scattering study of interface roughness correlation in Mo/Si and Ti/C multilayers for X-UV optics

(9) Jergel, M a Holy V b Majkova E a Luby, S a Senderak R a Stock, H J c Menke, D c Kleineberg, U c Heinzmann, U c

a INSTITUTE OF PHYSICS (Slovakia)

b MASARYK UNIVERSITY (Czech Republic)

c BIELEFELD UNIVERSITY (Germany)

Author keywords

Diffuse scattering; Multilayer; X UV optics

Indexed keywords

ALGORITHMS; APPROXIMATION THEORY; CORRELATION METHODS; ELECTRON BEAMS; EVAPORATION; INTERFACES (MATERIALS); OPTICAL VARIABLES MEASUREMENT; OPTICS; POLISHING; SPUTTERING; SURFACE ROUGHNESS; X RAY SCATTERING;

BORN APPROXIMATION; DIFFUSE SCATTERING; FRESNEL OPTICAL ALGORITHM; GRAZING INCIDENCE; X RAY REFLECTIVITY; X RAY ULTRAVIOLET OPTICS;

MULTILAYERS;

EID: 0032186871 PISSN: 09214526 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-4526(98)00385-8 Document Type: Article

Times cited : (18)

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