New phase shift gratings for measuring aberrations

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 25-35

  Nomura, Hiroshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Aberration; Focus; Overlay inspection tool; Phase shift reticle; Photolithography

Indexed keywords

DIFFRACTION GRATINGS; EXCIMER LASERS; PHASE SHIFT; PHOTOLITHOGRAPHY; WAVE INTERFERENCE; WAVEFRONTS;

PHASE SHIFT GRATINGS;

ABERRATIONS;

EID: 0035759065     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435738     Document Type: Conference Paper

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