New pattern generation system based on i-line stepper - Photomask Repeater

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 647-657

  Kyoh, S ^a   Inoue, S ^a   Higashikawa, I ^a   Mori, I ^a   Okumura, K ^a   Irie, N ^a   Muramatsu, K ^a   Magome, N ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR CORRECTION; INTEGRATED CIRCUIT MANUFACTURE; MASKS; MICROPROCESSOR CHIPS;

PHOTOMASKS;

PHOTOLITHOGRAPHY;

EID: 0033700372     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389056     Document Type: Conference Paper

References (5)