Investigation of high-precision lithography lens aberration measurement based on three-beam interference theory: Sensitivity versus coherent factor and variations with dose and focus

Optical Review

Volumn 7, Issue 6, 2000, Pages 525-534

  Nomura, Hiroshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Aberration; Coherent factor; Photolithography; Wavefront; Zernike polynomials

Indexed keywords

EID: 0034346183     PISSN: 13406000     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10043-000-0525-8     Document Type: Article

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