MoS2 nanoparticle formation in a low pressure environment

Journal of Applied Physics

Volumn 86, Issue 6, 1999, Pages 3442-3451

  Stoffels, E ^a,b   Stoffels, W W ^a,b   Ceccone, G ^a   Hasnaoui, R ^a   Keune, H ^a,c   Wahl, G ^a,c   Rossi, F ^a  

^a JOINT RESEARCH CENTRE   (Italy)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011965282     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371227     Document Type: Article

References (14)

1. H. Suhr, R. Schmid, and W. Stürmer, Plasma Chem. Plasma Process. 12, 147 (1992).
2. E. Broszeit, G. Kienel, and B. Matthes, Tribologie in Vakuumbeschichtung, Anwendungen Teil 2, Vol. 5, edited by G. Kienel (VDI Verlag, Düsseldorf, 1993), pp. 29-72.
3. Dusty Plasmas: Physics; Chemistry and Technological Impact in Plasma Processing, edited by A. Bouchoule (Wiley, New York, 1999).
4. H. Kersten, P. Schmelz, and G. M. W. Kroesen, Surf. Coat. Technol. 108-109, 493 (1998).
5. G. H. P. M. Swinkels, E. Stoffels, W. W. Stoffels, N. Simons, G. M. W. Kroesen, and F. J. de Hoog, Pure Appl. Chem. 70, 1151 (1998).
6. P. Roca i Cabarrocas, P. Gay, and A. Hadjadj, J. Vac. Sci. Technol. A 14, 655 (1996).
7. H. Keune and G. Wahl (unpublished data).
8. D. J. Rader and A. S. Geller, Plasma Sources Sci. Technol. 3, 426 (1994).
9. E. Stoffels, W. W. Stoffels, G. M. W. Kroesen, and F. J. de Hoog, Electron Technol. 31, 255 (1998).
10. O. Havnes, T. Nitter, V. Tsytovich, G. E. Morfill, and T. Hartquist, Plasma Sources Sci. Technol. 3, 448 (1994).
11. T. Matsoukas and M. Russel, J. Appl. Phys. 77, 4285 (1995).
12. J. P. Boeuf, Physics and Modeling, in Dusty Plasmas, edited by A. Bouchoule (Wiley, New York, in press).
13. M. Lelogeais and M. Ducarroir, Thin Solid Films 197, 257 (1991).
14. W. W. Stoffels, E. Stoffels, G. M. W. Kroesen, and F. J. de Hoog, J. Appl. Phys. 78, 4867 (1995).