Study of particulate formation and its control by a radio frequency power modulation in the reactive ion etching process of SiO2 with CF4/H2 plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 1, 1997, Pages 66-71

  Yeon, Chung Kyu ^a   Whang, Ki Woong ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031538533     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580478     Document Type: Article

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