Design and fabrication of submicrometer, single crystal Si accelerometer

Journal of Microelectromechanical Systems

Volumn 10, Issue 4, 2001, Pages 518-524

  Weigold, Jason W ^a,b   Najafi, Khalil ^a,b   Pang, Stella W ^a,b  

^a IEEE   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Accelerometer; Deep etching; Electron beam lithography; MEMS; Silicon

Indexed keywords

HIGH-DENSITY PLASMA ETCHING;

ACCELEROMETERS; ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; INDUCTIVELY COUPLED PLASMA; MICROMETERS; PLASMA ETCHING; SEMICONDUCTING SILICON;

MICROELECTROMECHANICAL DEVICES;

EID: 0035652176     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.967374     Document Type: Article

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