Merged process for thick single-crystal Si resonators and BiCMOS circuitry

Journal of Microelectromechanical Systems

Volumn 8, Issue 3, 1999, Pages 221-228

  Weigold, J W ^a   Wong, A C ^a   Nguyen, C T C ^a   Pang, S W ^a  

^a The Department of Civil and Environmental Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIPOLAR INTEGRATED CIRCUITS; CMOS INTEGRATED CIRCUITS; ELECTRIC CONDUCTANCE; ETCHING; MOS DEVICES; RESONATORS; SEMICONDUCTING SILICON; SILICON WAFERS; SINGLE CRYSTALS; THRESHOLD VOLTAGE;

THICK SINGLE CRYSTAL SILICON RESONATORS;

MICROELECTROMECHANICAL DEVICES;

EID: 0032595024     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.788624     Document Type: Article

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