Force-balanced accelerometer with mG resolution, fabricated using silicon fusion bonding and deep reactive ion etching

International Conference on Solid-State Sensors and Actuators, Proceedings

Volumn 2, Issue , 1997, Pages 1229-1232

  van Drieenhuizen, B P ^a   Maluf, N I ^a   Opris, I E ^a   Kovacs, G T A ^a  

^a Lucas NovaSensor   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; FUSION REACTIONS; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SENSITIVITY ANALYSIS;

CAPACITIVE SENSOR INTERFACE; ELECTRONIC INTERFACE; FORCE BALANCED ACCELEROMETER; SILICON FUSION BONDING;

ACCELEROMETERS;

EID: 0030704796     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)