Etch characteristics of SrBi2Ta2O9 (SBT) thin films using magnetized inductively coupled plasmas

Thin Solid Films

Volumn 398, Issue 399, 2001, Pages 652-656

  Lee, Young Joon ^a   Jeong, Chang Hyun ^a   Bae, Jeong Woon ^a   You, In Kyu ^b   Park, Jong Wan ^c   Yeom, Geun Young ^a  

^a Sungkyunkwan University   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^c Hanyang University   (South Korea)

Author keywords

Etch rate; Magnetized inductively coupled plasma; Thin films

Indexed keywords

ANISOTROPY; ETCHING; HETEROJUNCTIONS; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; PHOTORESISTS; STRONTIUM COMPOUNDS;

MAGNETIZED INDUCTIVELY COUPLED PLASMAS (MICP);

THIN FILMS;

EID: 0035508498     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01371-2     Document Type: Article

References (17)