A study on low dielectric material deposition using a helicon plasma source

Journal of the Electrochemical Society

Volumn 143, Issue 9, 1996, Pages 2990-2995

  Kim, Jung Hyung ^a,c   Seo, Sang Hun ^a,c   Yun, Seok Min ^a   Chang, Hong Young ^a,c   Lee, Kwang Man ^b   Choi, Chi Kyu ^b,c  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Jeju National University   (South Korea)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; DEPOSITION; ELLIPSOMETRY; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HELICONS; MAGNETIC FIELD EFFECTS; OXYGEN; PLASMA SOURCES; SILICON COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

LANGMUIR PROBE; RADIOFREQUENCY POWER; SILICON TETRAFLUORIDE;

DIELECTRIC FILMS;

EID: 0030247483     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837137     Document Type: Article

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