Stabilization of low dielectric constant SiOF films

Journal of the Korean Physical Society

Volumn 33, Issue SUPPL. 2, 1998, Pages

  Kim, Yoon Hae ^a   Kim, Hyeong Hoon ^a   Lee, Seok Kiu ^a   Kim, Hyeong Joon ^a   Kim, Sun Oo ^b   Sohn, Yong Sun ^b  

^a Seoul National University   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032281050     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

1. Y.-H. Kim et al., J. Electrochem. Soc (Submitted).
2. H. Kudo, R. Shinohara, S. Takeishi, N. Awah and M. Yamada, Jpn. J. Appl. Phys. 35, 1583 (1996).
3. B. K. Hwang, J. H. Choi, S. Lee, K. Fujihara, U.-I. Chung, S.-I. Lee and M.-Y. Lee, Jpn. J. Appl. Phys. 35, 1588 (1996).
4. T. Tamura, Y. Inoue, M. Satoh, H. Yoshitaka and J. Sakai, Jpn. J. Appl. Phys. 35, 2526 (1996).
5. N. Hayasaka, H. Miyajima, Y. Nakasaki and R. Katsumata, Ext. Abs. of 1995 Solid State Devices and Materials, 157 (1995).
6. H. Kito, M. Muroyama, M. Sazaki, M. Iwasawa and H. Kimura, Ext. Abs. of 1995 Solid State Devices and Materials, 160 (1995).
7. S. Takeishi, H. Kudoh, R. Shinohara, A. Tsukune, Y. Satoh, H. Miyazawa, H. Harada and M. Yamada, J. Electrochem. Soc. 143, 381 (1996).