Densifled SiOF film formation for preventing water absorption

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 2 SUPPL. B, 1996, Pages 1583-1587

  Kudo, Hiroshi ^a   Shinohara, Rika ^a   Takeishi, Shunsaku ^a   Awaji, Naoki ^a   Yamada, Masao ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Dielectric constant; Interlayer dielectric; PE CVD; SiOF; Water absorption

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DENSIFICATION; DENSITY (SPECIFIC GRAVITY); DENSITY CONTROL (SPECIFIC GRAVITY); DENSITY MEASUREMENT (SPECIFIC GRAVITY); OXIDES; OXYGEN; PERMITTIVITY; PLASMA APPLICATIONS; SPECTROSCOPY; WATER ABSORPTION;

FILM DENSITY; INTERLAYER DIELECTRIC; THERMAL DESORPTION SPECTROSCOPY;

DIELECTRIC FILMS;

EID: 0030079660     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.1583     Document Type: Article

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