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Volumn 146-147, Issue , 2001, Pages 398-404

Influence of substrate bias on the structure and mechanical properties of ta-C: W films deposited by filtered cathodic vacuum arc

(4) Cheng, Y H a Tay, B K a Lau, S P a Shi, X a

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

Filtered cathodic vacuum arc; Hardness; Internal stress; Raman spectroscopy; Ta C; W films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CORRELATION METHODS; DEPOSITION; ELASTIC MODULI; ELECTRIC POTENTIAL; HARDNESS; MORPHOLOGY; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; SUBSTRATES; TUNGSTEN;

FILTERED CATHODIC VACUUM ARC DEPOSITION;

AMORPHOUS FILMS;

CATHODIC ARC PLASMA DEPOSITION; COATING; DISK DRIVE; FILM; HARDNESS; WEAR RESISTANCE;

EID: 0035465686 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(01)01405-0 Document Type: Article

Times cited : (22)

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