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Journal of Applied Physics

Volumn 88, Issue 6, 2000, Pages 3699-3704

Investigation of molybdenum-carbon films (Mo-C:H) deposited using an electron cyclotron resonance chemical vapor deposition system

(10) Rusli, a Yoon, S F a Huang, Q F a Yang, H a Yu, M B a Ahn, J a Zhang, Q a Teo, E J b Osipowicz, T b Watt, F b

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001297104 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1288224 Document Type: Article

Times cited : (25)

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