Tungsten-carbon thin films deposited using screen grid technique in an electron cyclotron resonance chemical vapour deposition system

Surface and Coatings Technology

Volumn 123, Issue 2-3, 2000, Pages 134-139

  Rusli, ^a   Yoon, S F ^a   Yang, H ^a   Ahn, J ^a   Huang, Q F ^a   Zhang, Q ^b   Guo, Y P ^b   Yang, C Y ^b   Teo, E J ^b   Wee, A T S ^b   Huan, A C H ^b   Watt, F ^b  

^a Sch Elec Electron Eng   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Diamond like carbon; ECR CVD; Metal carbon films

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; HARDNESS; LIGHT ABSORPTION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; THIN FILMS; TUNGSTEN; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON CYCLOTRON RESONANCE CHEMICAL VAPOR DEPOSITION (ECR-CVD); SCREEN GRID METHOD; TUNGSTEN-CARBON FILMS;

COATINGS;

ABRASIVE WEAR; COATING; DIAMOND-LIKE CARBON; VAPOR DEPOSITION; WEAR;

EID: 0034707777     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00474-0     Document Type: Article

References (23)

1. Dimigen H., Hubsch H., Memming R. Appl. Phys. Lett. 50:1987;1056.
2. Klages C.P., Memming R. Mater. Sci. Forum. 52:1989;609.
3. Benndorf C., Grischke M., Koeberle H., Memming R., Brauer A., Thieme F. Surf. Coat. Technol. 36:1988;171.
4. Srivastava P.K., Rao T.V., Vankar V.D., Chopra K.L. J. Vac. Sci. Technol. A2:1984;1261.
5. Benndorf C., Harnack J.T., Fell U. Surf. Coat. Technol. 59:1993;345.
6. Wang T.M., Wang W.J., Jing C. Diamond Relat. Mater. 5:1996;1418.
7. Al-Ismail S.A.Y., Hogarth C.A. J. Mater. Sci. 22:1987;415.
8. Roy R.A., Messier R., Cowley J.M. Thin Solid Films. 79:1981;207.
9. Voevodin A.A., Capano M.A., Safriet A.J., Donley M.S., Zabinski J.S. Appl. Phys. Lett. 69:1996;188.
10. Koeberle H., Grischke M., Thieme F., Benndorf C., Memming R. Surf. Coat. Technol. 39/40:1989;275.
11. Harnack J.T., Thieme F., Benndorf C. Surf. Coat. Technol. 39/40:1989;285.
12. Yoon S.F., Rusli, Ahn J., Zhang Q., Wu Y.S, Yang H. J. Vac. Sci. Technol. 17:1999;121.
13. Reinke P., Scheiz S., Jacob W., Moller W. J. Vac. Sci. Technol. A10:1992;434.
14. Rusli, Yoon S.F., Yang H., Ahn J., Zhang Q., New W.L. J. Appl. Phys. 84:1998;5277.
15. Salvati L. Jr., Makovsky L.E., Stencel J.M., Brown F.R., Hercules D.M. J. Phys. Chem. 85:1981;3700.
16. Nefedov V.I., Firsov M.N., Shaplygin I.S. J. Electron Spectr. Related Phen. 26:1982;65.
17. Sherwood P.M.A. Briggs D., Seah M.P. Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy. 1983;445 John Wiley and Sons, New York.
18. Bursell M.C., Lin Y.S., Cole K.S. J. Vac. Sci. Technol. 4:1986;2459.
19. Laurent C., Kay E. J. Appl. Phys. 65:1989;1717.
20. Perrin J., Despax B., Kay E. Phys. Rev. B32:1985;719.
21. Craig S., Harding G.L. Thin Solid Films. 101:1983;97.
22. Rusli, Yoon S.F., Yang H., Zhang Q., Ahn J., Fu Y.L. J. Vac. Sci. Technol. A16:1998;572.
23. Yoon S.F., Rusli, Ahn J., Zhang Q., Wu Y.S., Yang H. Diamond Relat. Mater. 7:1998;1213.