Heat treatment of cathodic arc deposited amorphous hard carbon films

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 186-190

  Anders, Simone ^a   Ager III, Joel W ^a   Pharr, George M ^b   Tsui, Ting Y ^c   Brown, I G ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b Rice University   (United States)

^c ADVANCED MICRO DEVICES   (United States)

Author keywords

Cathodic arc deposition; Hard carbon films; Nanonindentation; Raman spectroscopy

Indexed keywords

ANNEALING; GRAPHITIZATION; NANOSTRUCTURED MATERIALS; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON;

CATHODIC ARC DEPOSITED AMORPHOUS HARD CARBON FILMS;

AMORPHOUS FILMS;

EID: 0031248799     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00385-4     Document Type: Article

References (28)

1. D.R. Tallant, J.E. Parmeter, M.P. Siegal and R.L. Simpson, Diamond Relat. Mater., 4 (1995) 191.
2. R.L.C. Wu, K. Miyoshi, R. Vuppuladhadium and H.E. Jackson, Surf. Coat. Technol., 54/55 (1992) 576.
3. A. Grill, V. Patel and B.S. Meyerson, J. Mater. Res., 5 (1990) 2531.
4. G.M. Pharr, D.L. Callahan, S.D. McAdams, et al., Appl. Phys. Lett., 68 (1996) 779.
5. P.J. Martin, S.W. Filipczuk, R.P. Netterfield, J.S. Field, D.W. Whitnall and D.R. McKenzie, J. Mater. Sci. Lett., 7 (1988) 410.
6. D.R. McKenzie, D. Muller and B.A. Pailthorpe, Phys. Rev. Lett., 67 (1991) 773.
7. R. Lossy, D.L. Pappas, R.A. Roy, J.J. Cuomo and V.M. Sura, Appl. Phys. Lett., 61 (1992) 171.
8. S. Falabella, D.B. Boercker and D.M. Sanders, Thin Solid Films, 236 (1993) 82.
9. P.J. Fallon, V.S. Veerasamy, C.A. Davis, et al., Phys. Rev., B 48 (1993) 4777.
10. H.J. Scheibe and B. Schultrich, Thin Solid Films, 246 (1994) 92.
11. E.G. Gerstner, D.P. McKenzie, M.K. Puchert and P.Y. Trimbell, J. Vac. Sci. Technol., A 13 (1995) 406.
12. J.J. Cuomo, D.L. Pappas, J. Bruley, J. Doyle and K.L. Saenger, J. Appl. Phys., 70 (1991) 1706.
13. J. Levoska and S. Leppävuori, Appl. Surf. Sci., 86 (1995) 180.
14. Y. Lifshitz, G.D. Lempert, E. Grossman, et al., Diamond Rel. Mater., 4 (1995) 318.
15. J.J. Cuomo, J. Doyle, J. Bruley and J.C. Liu, J. Vac. Sci. Technol., A9 (1991) 2210.
16. C.A. Lucas, T.D. Nguyen and J.B. Kortright, Appl. Phys. Lett., 59 (1991) 2100.
17. D.P. McKenzie, Y. Yin, N.A. Marks, et al., Non-Cryst. Solids, 164-166 (1993) 1101.
18. A. Anders, S. Anders and I.G. Brown, Plasma Sources Sci. Technol., 4 (1995) 1.
19. S. Anders, A. Anders, I.G. Brown, et al., Surf. Coat. Technol., 68/69 (1994) 388.
20. S. Anders, A. Anders, J.W. Ager III, et al., Mat. Res. Soc. Symp. Proc., 383 (1995) 447.
21. J.W. Ager III, S. Anders, A. Anders and I.G. Brown, Appl. Phys. Lett., 66 (1995) 3444.
22. G.M. Pharr, D.L. Callahan, S.D. McAdams, et al., Appl. Phys. Lett., 68 (1996) 779.
23. W.C. Oliver and G.M. Pharr, J. Mater Res., 7 (1992) 1564.
24. M.A. Tamor and W.C. Vassell, J. Appl. Phys., 76 (1994) 3823.
25. N.H. Cho, K.M. Krishnan, D.K. Veirs, et al., J. Mater. Res., 5 (1990) 2543.
26. B. Bhushan, A.J. Kellock, N.H. Cho and J.W. Ager III, J. Mater. Res., 7 (1992) 404.
27. D. Beeman, J. Silverman, R. Lynds and M.R. Anderson, Phys. Rev., B 30 (1994) 870.
28. A. Richter, H.J. Scheibe, W. Pompe, K.W. Brzezinka and I. Mühling, J. Non-Cryst. Solids, 88 (1986) 131.