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Volumn 342, Issue 1, 1999, Pages 100-107

Tungsten-containing amorphous carbon films deposited by pulsed vacuum arc

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CARBON; DEPOSITION; PLASMA SOURCES; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN; VACUUM TECHNOLOGY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0032651503     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01441-2     Document Type: Article
Times cited : (46)

References (20)
  • 11
    • 0344591227 scopus 로고    scopus 로고
    • 10th Int. Conf. on Ion Beam Modification of Materials (IBMM-96)
    • Albuquerque, NM in press
    • O.R. Monteiro, Z. Wang, P. Hou, I.G. Brown, 10th Int. Conf. on Ion Beam Modification of Materials (IBMM-96), Albuquerque, NM, 1996, in Nucl. Instrum. Methods B, in press.
    • (1996) In Nucl. Instrum. Methods B
    • Monteiro, O.R.1    Wang, Z.2    Hou, P.3    Brown, I.G.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.