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Volumn 342, Issue 1, 1999, Pages 100-107
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Tungsten-containing amorphous carbon films deposited by pulsed vacuum arc
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Author keywords
[No Author keywords available]
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Indexed keywords
ADHESION;
CARBON;
DEPOSITION;
PLASMA SOURCES;
RAMAN SPECTROSCOPY;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SILICON;
TRANSMISSION ELECTRON MICROSCOPY;
TUNGSTEN;
VACUUM TECHNOLOGY;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
PULSED VACUUM ARC DEPOSITION;
AMORPHOUS FILMS;
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EID: 0032651503
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(98)01441-2 Document Type: Article |
Times cited : (46)
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References (20)
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