Thermomechanical distortions of advanced optical reticles during exposure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 756-767

  Chang, J ^a   Abdo, A ^a   Kim, B ^a   Bloomstein, T ^a   Engelstad, R ^a   Lovell, E ^a   Beckman, W ^a   Mitchell, J ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCIUM COMPOUNDS; COMPUTER SIMULATION; FINITE ELEMENT METHOD; FUSED SILICA; HEAT TRANSFER; MASKS; MATHEMATICAL MODELS; SUBSTRATES; TEMPERATURE DISTRIBUTION;

OPTICAL RETICLES; PATTERN PLACEMENT ERROR; THERMOMECHANICAL DISTORTIONS;

PHOTOLITHOGRAPHY;

EID: 0032672987     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351144     Document Type: Conference Paper

References (13)