|
Volumn 37, Issue 9, 2001, Pages 1194-1202
|
1.55-μm buried-heterostructure VCSELs with InGaAsP/InP-GaAs/AlAs DBRs on a GaAs substrate
a a a a a a
a
NTT CORPORATION
(Japan)
|
Author keywords
Buried heterostructure; Semiconductor lasers; Vertical cavity surface emitting lasers (VCSELs); Wafer bonding
|
Indexed keywords
CURRENT DENSITY;
ELECTRIC RESISTANCE;
HETEROJUNCTIONS;
HIGH TEMPERATURE OPERATIONS;
LASER MODES;
MIRRORS;
OPTICAL RESOLVING POWER;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING INDIUM PHOSPHIDE;
SEMICONDUCTOR DEVICE MANUFACTURE;
THIN FILMS;
BURIED HETEROSTRUCTURE;
DISTRIBUTED BRAGG REFLECTORS;
THIN FILM WAFER FUSION TECHNOLOGY;
THRESHOLD CURRENT;
VERTICAL CAVITY SURFACE EMITTING LASERS;
WAFER BONDING;
SEMICONDUCTOR LASERS;
|
EID: 0035444698
PISSN: 00189197
EISSN: None
Source Type: Journal
DOI: 10.1109/3.945325 Document Type: Article |
Times cited : (16)
|
References (30)
|