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Journal of Micromechanics and Microengineering

Volumn 11, Issue 5, 2001, Pages 532-541

Soft and rigid two-level microfluidic networks for patterning surfaces

(7) Juncker, David a,b Schmid, Heinz a Bernard, André a Caelen, Isabelle c Michel, Bruno a De Rooij, Nico b Delamarche, Emmanuel a

a IBM RESEARCH ZURICH (Switzerland)

b UNIVERSITY OF NEUCHÂTEL (Switzerland)

c CSEM (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; ELASTOMERS; FLOW OF FLUIDS; FLUIDITY; HYDROPHOBICITY; PHOTORESISTS; REACTIVE ION ETCHING; SILICONES; SUBSTRATES; SURFACE STRUCTURE; WATER; WETTING;

DEEP REACTIVE ION ETCHING; HYDROPHILIC MICROCHANNEL; INTERCHANNEL CROSSTALK; MICROCHANNEL; POLYDIMETHYLSILOXANE; SOFT LITHOGRAPHY; SOFT MICROFLUIDIC NETWORK; TWO-LEVEL MICROFLUIDIC NETWORK;

PHOTOLITHOGRAPHY;

EID: 0035442494 PISSN: 09601317 EISSN: None Source Type: Journal
DOI: 10.1088/0960-1317/11/5/314 Document Type: Article

Times cited : (51)

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