High aspect ratio UV photolithography for electroplated structures

Journal of Micromechanics and Microengineering

Volumn 9, Issue 2, 1999, Pages 105-108

  Roth, S ^a   Dellmann, L ^a   Racine, G A ^a   De Rooij, N F ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; ELECTRODEPOSITION; MICROACTUATORS; MICROELECTROMECHANICAL DEVICES; MICROELECTRONICS; NICKEL; PHOTORESISTS; THICK FILMS;

ELECTROPLATED STRUCTURES; NICKEL ELECTRODEPOSITION; PHOTORESIST PATTERNING; RESIST MOULDS; ULTRAVIOLET PHOTOLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0033138345     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/9/2/001     Document Type: Article

References (10)

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