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Journal of the Electrochemical Society

Volumn 146, Issue 9, 1999, Pages 3398-3402

Influence of surface roughness on the electric conduction process in amorphous Ta2O5 thin films

(5) Kim, Y S a Sung, M Y a Lee, Y H b Ju, B K b Oh, M H b

a Korea University (South Korea)

b Korea Institute of Science and Technology (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; COMPUTER SIMULATION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC FIELD EFFECTS; ELECTROCHEMICAL ELECTRODES; HIGH TEMPERATURE EFFECTS; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TANTALUM COMPOUNDS; THIN FILMS;

POOLE-FRENKEL CURRENT; SCHOTTKY EMISSION CURRENTS; SOFTWARE PACKAGE MEDICI; TANTALUM OXIDE;

AMORPHOUS FILMS;

EID: 0033363982 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1392485 Document Type: Article

Times cited : (29)

References (17)

1
- 0030397789
- K. A. McKinley and N. P. Sandler, Thin Solid Films, 290-291, 440 (1996).
- (1996) Thin Solid Films , vol.290-291 , pp. 440
- McKinley, K.A.¹ Sandler, N.P.²

2
- 0024737724
- T. Shibank and S. H. Rustomji, Elec. Dev., 36, 1947 (1989).
- (1989) Elec. Dev. , vol.36 , pp. 1947
- Shibank, T.¹ Rustomji, S.H.²

3
- 0032073164
- S. Ezhilvalavan and Tseung-Yuen Tseng, J. Appl. Phys., 83, 4797 (1998).
- (1998) J. Appl. Phys. , vol.83 , pp. 4797
- Ezhilvalavan, S.¹ Tseng, T.-Y.²

4
- 0343571796
- P. L. Young, J. Appl. Phys., 47, 241 (1976).
- (1976) J. Appl. Phys. , vol.47 , pp. 241
- Young, P.L.¹

5
- 0040322495
- F.-C. Chiu, J.-J. Wang, J. Y. Lee, and S. C. Wu, J. Appl. Phys., 81, 6911 (1997).
- (1997) J. Appl. Phys. , vol.81 , pp. 6911
- Chiu, F.-C.¹ Wang, J.-J.² Lee, J.Y.³ Wu, S.C.⁴

6
- 0032019420
- T. Dimitrova and E. Atanassova, Solid-State Electron., 42, 307 (1998).
- (1998) Solid-State Electron. , vol.42 , pp. 307
- Dimitrova, T.¹ Atanassova, E.²

7
- 0030110635
- M. C. Lopes, S. G. dos Santos F., and C. M. Hasenack, J. Electrochem. Soc., 143, 1021 (1996).
- (1996) J. Electrochem. Soc. , vol.143 , pp. 1021
- Lopes, M.C.¹ Dos Santos F., S.G.² Hasenack, C.M.³

8
- 0343571795
- H. Tanaka, H. Uchida, N. Hirashita, and T. Ajioka, IEEE IRPS, 31 (1992).
- (1992) IEEE IRPS , pp. 31
- Tanaka, H.¹ Uchida, H.² Hirashita, N.³ Ajioka, T.⁴

9
- 0342701470
- J. H. Oh, Y. H. Lee, B. K. Ju, D. K. Shin, C. Y. Park, and M. H. Oh, J. Appl.Phys., 82, 6230 (1997).
- (1997) J. Appl.phys. , vol.82 , pp. 6230
- Oh, J.H.¹ Lee, Y.H.² Ju, B.K.³ Shin, D.K.⁴ Park, C.Y.⁵ Oh, M.H.⁶

10
- 0030142692
- S. Shibata, Thin Solid Films, 277, 1 (1996).
- (1996) Thin Solid Films , vol.277 , pp. 1
- Shibata, S.¹

11
- 0018922661
- H. Matsumoto, A. Suzuki, and T. Yabumoto, Jpn. J. Appl. Phys., 19, 71 (1980).
- (1980) Jpn. J. Appl. Phys. , vol.19 , pp. 71
- Matsumoto, H.¹ Suzuki, A.² Yabumoto, T.³

12
- 0017006618
- E. Kaplan, M. Barlog, and D. Frohman-Bentchkowsky, J. Electrochem. Soc., 123, 1570 (1976).
- (1976) J. Electrochem. Soc. , vol.123 , pp. 1570
- Kaplan, E.¹ Barlog, M.² Frohman-Bentchkowsky, D.³

13
- 36549104227
- G. S. Oehrlein, J. Appl. Phys., 59, 1587 (1986).
- (1986) J. Appl. Phys. , vol.59 , pp. 1587
- Oehrlein, G.S.¹

14
- 36049053259
- J. G. Simmons, Phys. Rev., 166, 912 (1968).
- (1968) Phys. Rev. , vol.166 , pp. 912
- Simmons, J.G.¹

15
- 3743120964
- G. Palasantzas and J. Krim, Phys. Rev., 73, 3564 (1994).
- (1994) Phys. Rev. , vol.73 , pp. 3564
- Palasantzas, G.¹ Krim, J.²

16
- 0001761658
- T. S. Rahman and A. A. Maradudin, Phys. Rev. B, 21, 504 (1980).
- (1980) Phys. Rev. B , vol.21 , pp. 504
- Rahman, T.S.¹ Maradudin, A.A.²

17
- 0031189738
- G. Palasantzas, J. Appl. Phys., 82, 351 (1997).
- (1997) J. Appl. Phys. , vol.82 , pp. 351
- Palasantzas, G.¹

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