Anomalous dielectric dispersion in tantalum oxide films prepared by RF sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 9 A, 1998, Pages 4900-4903

  Miyairi, Keiichi ^a  

^a SHINSHU UNIVERSITY   (Japan)

Author keywords

Dielectric constant; Dielectric dispersion; Dielectric loss; Interfacial polarization; Reactive sputtering; Tantalum oxide; Thin film

Indexed keywords

DIELECTRIC FILMS; DIELECTRIC LOSSES; DISPERSION (WAVES); ELECTRIC VARIABLES MEASUREMENT; INTERFACIAL ENERGY; PERMITTIVITY; POLARIZATION; SPUTTER DEPOSITION; TEMPERATURE; THIN FILMS;

DIELECTRIC DISPERSION; INTERFACIAL POLARIZATION; MAXWELL-WAGNER MECHANISM; RADIO FREQUENCY SPUTTERING; TANTALUM OXIDE;

TANTALUM COMPOUNDS;

EID: 0032154564     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.4900     Document Type: Article

References (12)

1. H. Shinriki and M. Nakata: IEEE Trans. Electron Devices 38 (1991) 455.
2. S. J. Ingrey, W. J. Westwood, Y. C. Cheng and J. Wei: Appl. Opt. 14 (1975) 2194.
3. K. Miyairi: Proceeding of Conference on Electrical Insulation and Dielectric Phenomena, (Minneapolis, Minnesota, 1997) p. 125.
4. D. Gerstenberg: J. Electrochem. Soc. 113 (1966) 542.
5. S Schiller: Thin Solid Films 63 (1979) 369.
6. W. Westwood, N. Waterhouse and P. Wilcox: Tantalum Thin Films (Academic Press, London, 1975) p. 358.
7. M. Takeuchi: Thin Solid Films 51 (1978) 83.
8. M. Yamazaki and H. Nozaki: Jpn. J. Appl. Phys. 11 (1972) 945.
9. T. Itoh, H. Ishikawa and H. Nakamura: Thin Film Technology of VLSI (Maruzen, Tokyo, 1986) p. 118 [in Japanese].
10. W. Westwood, N. Waterhouse and P. Wilcox: Tantalum Thin Films (Academic Press, London, 1975) p. 391.
11. W. Westwood, N. Waterhouse and P. Wilcox: Tantalum Thin Films (Academic Press, London, 1975) p. 395.
12. K. Tominaga, R. Muhammet, I. Kobayashi and M. Okada: Jpn. J. Appl. Phys. 31 (1972) L585.