Nitrogen plasma annealing for low temperature Ta2O5 films

Applied Physics Letters

Volumn 72, Issue 11, 1998, Pages 1308-1310

  Alers, G B ^a   Fleming, R M ^a   Wong, Y H ^a   Dennis, B ^a   Pinczuk, A ^a   Redinbo, G ^b   Urdahl, R ^b   Ong, E ^b   Hasan, Z ^c  

^a LUCENT TECHNOLOGIES   (United States)

^b APPLIED MATERIALS INC   (United States)

^c Gasonics IPC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001339749     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120569     Document Type: Article

References (8)

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