|
Volumn 142-144, Issue , 2001, Pages 688-692
|
The effect of d.c. substrate bias on the properties of nitrogen-rich CNx films
|
Author keywords
Carbon nitride; D.c. bias; Inductively coupled plasma chemical vapor deposition
|
Indexed keywords
ATOMIC FORCE MICROSCOPY;
CHEMICAL VAPOR DEPOSITION;
DENSIFICATION;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
ION BOMBARDMENT;
SURFACE ROUGHNESS;
SURFACE TOPOGRAPHY;
TRANSPORT REACTIONS;
SUBSTRATES;
CARBON NITRIDE;
|
EID: 0035386392
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(01)01158-6 Document Type: Article |
Times cited : (6)
|
References (26)
|