CNxHy films obtained by ECR plasma activated CVD: The role of substrate bias (DC, RF) and some other deposition parameters in growth mechanisms

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 65-73

  Shaginyan, L R ^a   Fendrych, F ^b   Jastrabik, L ^b   Soukup, L ^b   Kulikovsky, V Yu ^a   Musil, J ^b  

^a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

^b INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

CVD; ECR plasma; Hydrogenated carbon nitrides; Substrate bias

Indexed keywords

DIELECTRIC FILMS; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; HYDROGENATION; INFRARED SPECTROSCOPY; INORGANIC COATINGS; ION BOMBARDMENT; MICROHARDNESS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; THIN FILMS;

CARBON NITRIDES;

NITRIDES;

EID: 0033342139     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00068-7     Document Type: Article

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