Crystallization and decrease in resistivity on heat treatment of amorphous indium tin oxide thin films prepared by d.c. magnetron sputtering

Thin Solid Films

Volumn 339, Issue 1-2, 1999, Pages 309-313

  Morikawa, Hiroshi ^a   Fujita, Miya ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Conductivity; Crystallization; Indium tin oxide; Transmission electron microscopy

Indexed keywords

AMORPHOUS FILMS; CARRIER CONCENTRATION; CRYSTAL GROWTH; CRYSTALLIZATION; FILM PREPARATION; HALL EFFECT; HEAT TREATMENT; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

INDIUM TIN OXIDE;

CONDUCTIVE FILMS;

EID: 0033534992     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01156-0     Document Type: Article

References (15)

1. S. Takaki, K. Matsumoto, K. Suzuki, Appl. Surf. Sci. 33/34 (1998) 919.
2. S. Ishibashi, Y. Higuchi, Y. Ota, K. Nakamura, J. Vac. Sci. Technol. A 8 (1990) 1403.
3. M. Hoheisel, A. Mitwalsky, C. Mrotzek, Phys. Status Solidi A 123 (1991) 461.
4. H. Morikawa, H. Sumi, M. Kohyama, Thin Solid Films 281-282 (1996) 202.
5. A.J. Steckl, G. Mohammed, J. Appl. Phys. 51 (1980) 3890.
6. F.T.J. Smith, S.L. Lyu, J. Electrochem. Soc. 128 (1981) 2388.
7. M. Libra, L. Bardos, Vacuum 38 (1988) 455.
8. T.A. Gessert, D.L. Williamson, T.J. Coutts, A.J. Nelson, K.M. Jones, R.G. Dhere, H. Aharoni, P. Zurcher, J. Vac. Sci. Technol. A 5 (1987) 1314.
9. J.B. Bellingham, W.A. Phillips, C.J. Adkins, J. Phys.: Condens. Matter 2 (1990) 6207.
10. Y. Shigesato, D.C. Paine, Appl. Phys. Lett. 62 (1993) 1268.
11. W. Wu, B. Chiou, Appl. Surf. Sci. 68 (1993) 497.
12. M. Higuchi, S. Uekusa, R. Nakano, K. Yokogawa, Jpn. J. Appl. Phys. 33 (1) (1994) 302.
13. F.M. Amanullah, K.J. Pratap, V.H. Babu, Thin Solid Films 254 (1995) 28.
14. Y. Shigesato, S. Takaki, T. Haranou, Appl. Surf. Sci. 48/49 (1991) 269.
15. Y. Shigesato, S. Takaki, T. Haranoh, J. Appl. Phys. 71 (1992) 3356.