The effects of oxygen content on electrical and optical properties of indium tin oxide films fabricated by reactive sputtering

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 206-208

  Honda, Shinich ^a   Watamori, Michio ^a   Oura, Kenjiro ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Electrical properties and measurements; Optical properties; Oxides; Rutherford backscattering spectroscopy

Indexed keywords

ELECTRONIC PROPERTIES; INDIUM COMPOUNDS; ION BEAMS; OPTICAL PROPERTIES; OXYGEN; PRESSURE EFFECTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING;

INDIUM TIN OXIDE; OPTICAL BAND GAP; PARTIAL PRESSURE; REACTIVE SPUTTERING; RESONANT BACKSCATTERING;

CONDUCTIVE FILMS;

EID: 0030218505     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08614-2     Document Type: Article

References (13)

1. S. Honda, A. Tsujimoto, M. Watamori and K. Oura, Jpn. J. Appl. Phys., 33 (1994) L1257.
2. S. Honda, A. Tsujimoto, M. Watamori and K. Oura, J. Vac. Sci. and Technol., A 13 (1995) 1100.
3. F. Shoji and K. Oura, Jpn. J. Appl. Phys., 29 (1990) L812.
4. F. Shoji, A. Ogawa and K. Oura, Appl. Surf. Sci., 48/49 (1991) 373.
5. S. Honda, A. Tsujimoto, S. Ohkura, Y. Kawashimo, F. Shoji and K. Oura, Surf. Modif. Technol., 7 (1994) 869.
6. M. Watamori, F. Shoji and K. Oura, Jpn. J. Appl. Phys., 33 (1994) 6039.
7. S. Ray, R. Banerjee, N. Basu, A.K. Batabyal and A.K. Barua, J. Appl. Phys., 54 (1983) 3497.
8. E. Burstein, Phys. Rev., 93 (1954) 632.
9. T.S. Moss, Proc. Phys. Soc. London B, 67 (1954) 775.
10. R.L. Weiher and R.P. Ley, J. Appl. Phys., 37 (1966) 299.
11. J.R. Bellingham, A.P. Mackenzie and W.A. Phillips, Appl. Phys. Lett., 58 (1991) 2506.
12. I. Hamberg and C.G. Granqvist, J. Appl. Phys., 60 (1986) R123.
13. Y. Ohhata, F. Shinoki and S. Yoshida, Thin Solid Films, 59 (1979) 255.