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Journal of Materials Research

Volumn 16, Issue 3, 2001, Pages 744-752

Surface studies of phase formation in Co–Ge system: Reactive deposition epitaxy versus solid-phase epitaxy

(2) Goldfarb, Ilan a Briggs, G A D b

a TEL AVIV UNIVERSITY (Israel)

b UNIVERSITY OF OXFORD (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; GERMANIUM; HIGH ENERGY ELECTRON DIFFRACTION; LATTICE CONSTANTS; MORPHOLOGY; SCANNING TUNNELING MICROSCOPY;

REACTIVE DEPOSITION EPITAXY; SOLID-PHASE EPITAXY;

COBALT COMPOUNDS;

EID: 0035295315 PISSN: 08842914 EISSN: None Source Type: Journal
DOI: 10.1557/JMR.2001.0103 Document Type: Article

Times cited : (21)

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