Diffusion mediated chemical reaction in Co/Ge/Si(100) forming Ge/CoSi2/Si(100)

Applied Physics Letters

Volumn 68, Issue 9, 1996, Pages 1241-1243

  Prabhakaran, K ^a   Sumitomo, K ^a   Ogino, T ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009222901     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115939     Document Type: Article

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